Silicon ≥99.999% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)

Supplier: Thermo Scientific
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40890.KSEA 259 GBP
40890.KS
Silicon ≥99.999% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
Silicon

Magnetron sputtering source

Formula: Si
MW: 28.09 g/mol
Boiling Pt: 2355 °C (1013 hPa)
Melting Pt: 1410 °C
Density: 2.34 g/cm³ (20 °C)
Storage Temperature: Ambient
MDL Number: MFCD00085311
CAS Number: 7440-21-3
EINECS: 231-130-8
Merck Index: 12,08635

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